GEW launched the E4C UV curing system at the Chicago show
UK-headquartered GEW introduced a new water-cooled curing system at Labelexpo Americas. E4C offers the highest power available from the company’s range and has been developed to support demanding UV applications.
The new system is available in widths of up to 130cm and can deliver power of up to 200W/cm, which is 40% higher than the existing E2C system. It features a compact profile and is retrofittable on all E2C installations.
According to Robert Rae, technology development manager, the system is ‘versatile, controllable and safe for the widest range of heat-sensitive materials, whilst operating quietly with minimal air requirements.’
He also explained that E4C features optically tuned reflectors to maximise curing power, saying, ‘The water-cooled reflectors support the highest UV power whilst limiting heat transfer to the substrate.’
E4C is designed to operate with the lowest level of maintenance and is also LED-ready: the hybrid lamp casing can house either LW2 LED or E4C arc lamp cassettes.
The new system is available with multi-point UV monitoring, mUVm, and is compatible with inert atmosphere curing and doped lamps (Fe or Ga). It can be customised to suit specialist applications.
